Refining Mask 63 eur

Rasuimav savi puhastab nahka j aleevendab ärritust, samal ajal kui tõestatud vistrikevastased koostisosad vähendavad pooride tekkimist ja täiustavad nahatekstuuri.

pH 8.5

Nahatüüpnormaalne-rasune, rasune

Naha probleem: akne

Kasutamine: Kanna puhtale ja toniseeritud nahale ühtlane kiht maski ning lase sel toimida 10 minutit. Seejärel eemalda mask niiske meigieemaldus käsna või riidega. Kasuta kuni kolm korda nädalas.

Koostis: Aqua (Water/Eau), Glycerin, Sulfur, Zinc Oxide, Caprylic/Capric Triglyceride, Bentonite, Stearic Acid, Kaolin, Cetyl Alcohol, C12-15 Alkyl Benzoate, Titanium Dioxide (CI 77891), Brassica Oleracea Italica (Broccoli) Seed Oil, Glycol Distearate, Tocopherol (D-alpha), Tetrahexyldecyl Ascorbate, Tocopheryl Acetate (D-alpha), Glycine Soja (Soybean) Protein, Dimethicone, Alcohol Denat., Xanthan Gum, Glycine Soja (Soybean) Oil, Glyceryl Stearate, Lecithin, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Allantoin, Glycyrrhiza Glabra (Licorice) Root Extract, Gaultheria Procumbens (Wintergreen) Leaf Oil, Hamamelis Virginiana (Witch Hazel), Cocamidopropyl Hydroxysultaine, Dimethicone Crosspolymer, Laureth-4, Cyclopentasiloxane, Laureth-23, Cucumis Sativus (Cucumber) Fruit Extract, Melaleuca Alternifolia (Tea Tree) Leaf Oil, Chamomilla Recutita (Matricaria) Flower Extract, Lonicera Caprifolium (Honeysuckle) Flower Extract, Lonicera Japonica (Honeysuckle) Flower Extract, Calendula Officinalis Flower Extract, Passiflora Laurifolia (Passionflower) Flower Extract, Citric Acid, Trisodium Ethylenediamine Disuccinate, Carbomer, Sodium Hydroxide, Caprylyl Glycol, Phenethyl Alcohol, Potassium Sorbate, Phenoxyethanol

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